Ngā Hau Motuhake
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Tetrafluoride whānariki (SF4)
Nama EINECS: 232-013-4
Nama CAS: 7783-60-0 -
Waikura Hauota (N2O)
Ko te hauota hauota, e mōhiotia ana ko te hau kata, he matū morearea kei roto te tātai matū N2O. He hau kore tae, he kakara reka. He waikura te N2O ka taea te tautoko i te mura i raro i ētahi āhuatanga, engari he pumau i te pāmahana rūma, ā, he iti noa te pānga whakamoe. , ā, ka taea te kata i te tangata. -
Tetrafluoride Waro (CF4)
Ko te waro tetrafluoride, e mōhiotia ana ko te tetrafluoromethane, he hau kore tae i te pāmahana me te pēhanga noa, kāore e wairewa i roto i te wai. Ko te hau CF4 te hau whakairo plasma e whakamahia whānuitia ana i roto i te umanga hiko moroiti. Ka whakamahia hoki hei hau laser, hei hau whakamatao cryogenic, hei whakarewa, hei hinu whakahinuhinu, hei rauemi whakamatao, hei whakamatao hoki mō ngā ngongo kite infrared. -
Te Pūhaumāota Whanariki (F2O2S)
Ko te hau paitini o te sulfuryl fluoride SO2F2, e whakamahia whānuitia ana hei patu pepeke. Nā te mea he kaha te horapa me te uruhanga o te sulfuryl fluoride, he whānui te whānuitanga o te patu pepeke, he iti te horopeta, he iti te toenga, he tere te patu pepeke, he poto te wā horapa o te hau, he watea te whakamahinga i te pāmahana iti, kāore he pānga ki te tere whakatipu me te iti o te paitini, ka nui haere te whakamahinga i roto i ngā whare putunga, ngā kaipuke utanga, ngā whare, ngā tāhuna puna wai, te aukati moko, me ētahi atu. -
Silane (SiH4)
He hau pēhi kore tae, paitini, ā, he tino kaha te Silane SiH4 i te pāmahana me te pēhanga noa. He whānuitia te whakamahinga o te Silane i roto i te tipu epitaxial o te silicon, ngā rauemi mata mō te polysilicon, te silicon oxide, te silicon nitride, me ētahi atu, ngā pūtau rā, ngā muka whatu, te hanga karāhe tae, me te whakatakotoranga kohu matū. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, parakore hau: 99.999%, he maha ngā wā e whakamahia ana hei pūwero aerosol kai me te hau waenga. He maha ngā wā e whakamahia ana i roto i te tukanga semiconductor PECVD (Plasma Enhance. Chemical Vapor Deposition), ka whakamahia te C4F8 hei whakakapi mō te CF4, te C2F6 rānei, hei hau horoi me te hau whakairo tukanga semiconductor. -
Waikura Hauota (NO)
Ko te hau waikura hauota he matū hauota, ko tōna tauira matū ko NO. He hau kore tae, kore kakara, he paitini, kāore e wairewa i roto i te wai. He tino tauhohe te matū o te waikura hauota, ā, ka tauhohe ki te hāora hei hanga i te hau waikura hauota hauhā (NO₂). -
Te hauwai hauota (HCl)
He hau kore tae te hau hauwai kōraira HCL, he kakara kino tōna. Ko tōna wairewa e kiia ana ko te waikawa hauwai kōraira, e mōhiotia ana hoki ko te waikawa hauwai kōraira. Ko te hauwai kōraira te mea e whakamahia nuitia ana hei hanga tae, mea kakara, rongoā, momo hauwai kōraira me ngā aukati waikura. -
Hexafluoropropylene (C3F6)
Ko te Hexafluoropropylene, te tauira matū: C3F6, he hau kore tae i te pāmahana me te pēhanga noa. E whakamahia ana mō te whakarite i ngā momo hua matū pai kei roto he fluorine, ngā takawaenga rongoā, ngā kaihoko tinei ahi, me ētahi atu, ā, ka taea hoki te whakamahi hei whakarite i ngā rauemi polymer kei roto he fluorine. -
Āmonia (NH3)
He rauemi matū nui te haukini wai/haukini korewai, ā, he whānuitia ngā whakamahinga. Ka taea te whakamahi i te haukini wai hei whakamatao. Ko te nuinga o te wā ka whakamahia hei hanga waikawa hauota, urea me ētahi atu maniua matū, ā, ka taea hoki te whakamahi hei rauemi mata mō te rongoā me ngā patu pepeke. I roto i te umanga parepare, ka whakamahia hei hanga i ngā pūwero mō ngā rōkete me ngā pere.
